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Roles of underlayers in EUV lithography is the keynote speech at major tech conference in Asia.
June 21, 2022
By: DAVID SAVASTANO
Editor, Ink World Magazine
Brewer Science, Inc. will present the keynote address, “Roles of Underlayers in Novel Patterning for EUV Lithography,” at the China Semiconductor Technology International Conference (CSTIC), one of the largest and the most comprehensive annual semiconductor technology conferences in Asia. EUV lithography is used to pattern the smallest features in advanced semiconductor devices. The demand for smaller devices with more capabilities requires industry innovation in EUV processes and materials. ...
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